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Hydrogen fluoride (HF for brief), additionally called fluoric acid, is an aqueous solution of anhydrous hydrogen fluoride gas, which is very harsh and also extremely poisonous.
Hydrofluoric acid is a colorless, transparent to pale yellow smoky liquid at room temperature with a pungent odor.
Hydrogen fluoride reacts with sulfur trioxide or chlorosulfonic acid to generate fluorosulfonic acid, and reacts with halogenated aromatic hydrocarbons, alcohols, alkenes, and hydrocarbons to generate fluorine-containing organic compounds.
It is easy to fester when it touches the skin, and its degree is more severe than any acid. If the vapor is inhaled, it can be fatal, so strict attention must be paid when using it.
Anhydrous hydrogen fluoride has relatively strong bonding ability between hydrogen atoms and fluorine atoms, so that hydrofluoric acid cannot be completely ionized in water.
Therefore, in theory, low-concentration hydrofluoric acid is a weak acid, but hydrofluoric acid can dissolve many silica glasses that other acids cannot.
As an industrial resources, hydrogen fluoride is commonly used in the manufacture of products such as cooling agents, fuel as well as light weight aluminum.
Hydrogen Fluoride is mainly used as a resources for fluorine-containing compounds, and also is also made use of in the manufacture of light weight aluminum fluoride as well as cryolite, semiconductor surface etching and also as a driver for alkylation.
Main uses of electronic grade hydrogen fluoride
Hydrogen fluorid is also widely used in TFT-LCD and semiconductor industries.
Liquid hydrofluoric acid can also be used as analytical reagents, atomic energy industrial chemical reagents and preparation of high-purity fluorine-containing chemicals.
At present, Hydrogen Fluoride is basically used as an etchant and cleaning agent in the microelectronics industry, and the amount in other aspects is less.
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