Hydrogen Fluoride CAS 7664-39-3

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Hydrogen Fluoride
7664-39-3

Name: Hydrogen Fluoride

Cas: 7664-39-3

Purity: 99%min

MOQ: 1KG

Directory Guidance on Hydrogen Fluoride

Chemical Structure

Hydrogen Fluoride

Basic Info:

CAS No:7664-39-3
Formula:FH
EINECS:231-634-8
Stock AvailabilityIn stock
Brand NameLook chemical
OriginChina

Product Introduction:

Hydrogen fluoride (HF for brief), additionally called fluoric acid, is an aqueous solution of anhydrous hydrogen fluoride gas, which is very harsh and also extremely poisonous.

Hydrofluoric acid is a colorless, transparent to pale yellow smoky liquid at room temperature with a pungent odor.

Hydrogen fluoride reacts with sulfur trioxide or chlorosulfonic acid to generate fluorosulfonic acid, and reacts with halogenated aromatic hydrocarbons, alcohols, alkenes, and hydrocarbons to generate fluorine-containing organic compounds.

It is easy to fester when it touches the skin, and its degree is more severe than any acid. If the vapor is inhaled, it can be fatal, so strict attention must be paid when using it.

Anhydrous hydrogen fluoride has relatively strong bonding ability between hydrogen atoms and fluorine atoms, so that hydrofluoric acid cannot be completely ionized in water.

Therefore, in theory, low-concentration hydrofluoric acid is a weak acid, but hydrofluoric acid can dissolve many silica glasses that other acids cannot.

As an industrial resources, hydrogen fluoride is commonly used in the manufacture of products such as cooling agents, fuel as well as light weight aluminum.

Nature and Specifications:

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Product Usage:

Hydrogen Fluoride is mainly used as a resources for fluorine-containing compounds, and also is also made use of in the manufacture of light weight aluminum fluoride as well as cryolite, semiconductor surface etching and also as a driver for alkylation.

  1. Hydrofluoric acid plays an important function in the filtration of aluminum and also uranium because of its capability to liquify oxides.
  2. Hydrogen fluoride is likewise made use of to engrave glass, which can etch patterns, mark ranges as well as message;
  3. It is made use of in the semiconductor sector to eliminate oxides on the surface of silicon. In oil refineries, it can be used as a stimulant for the alkylation of isobutane as well as n-butene, and in the process of “pickling” to get rid of oxygen-containing pollutants on the surface of stainless-steel. Hydrofluoric acid is likewise utilized.
  4. Anhydrous hydrogen fluoride is likewise made use of in the synthesis of various fluorine-containing organics, such as Teflon (polytetrafluoroethylene) as well as cooling agents such as Freon.

Main uses of electronic grade hydrogen fluoride

  • It is made use of as a solid acid etchant in the digital market, and can be used together with nitric acid, acetic acid, ammonia water and also hydrogen peroxide.
  • The products are primarily made use of in the manufacture of integrated circuits (IC) and also huge range integrated circuits (VLSI), as well as electronic quality high-purity anhydrous hydrogen fluoride is just one of the crucial complementary materials.
  • Liquid hydrofluoric acid is generally utilized for wafer surface area cleansing, cleansing as well as etching during chip handling.
  • In the solar photovoltaic industry, hydrofluoric acid is used in the fields of silicon wafer surface cleaning and etching.
  • The first process from silicon ingots to silicon wafers and then to cells: products are used in the cleaning and texturing process.
  • In the liquid crystal display industry, hydrogen fluorid is used for glass substrate cleaning, silicon nitride, silicon dioxide etchants, etc.

Hydrogen fluorid is also widely used in TFT-LCD and semiconductor industries.

Liquid hydrofluoric acid can also be used as analytical reagents, atomic energy industrial chemical reagents and preparation of high-purity fluorine-containing chemicals.

At present, Hydrogen Fluoride is basically used as an etchant and cleaning agent in the microelectronics industry, and the amount in other aspects is less.

Physicochemical Properties of Hydrogen Fluoride:

physical properties

  • The typical concentration of readily offered Hydrogen Fluoride: 40% mass portion of solute, commercial grade.
  • The mass fraction is 40%, electronic grade.
  • Hydrogen Fluoride is a highly hazardous poisonous substance.
  • The density of one of the most focused 1.18 g/cm3.
  • With the increase of the mass fraction of HF solution, the rust price of HF to carbon steel increased first and after that decreased.

chemical properties

  • When the focus of Hydrogen Fluoride is reduced, it is weakly acidic due to the development of hydrogen bonds, yet when it is focused (above 5mol/L), self-ionization will happen, and hydrofluoride is a really acidic acid currently.
  • Fluid hydrogen fluoride is an extremely strong acid, its acidity is comparable to that of anhydrous sulfuric acid, yet weaker than that of fluorosulfonic acid.
  • It is very destructive and also causes major damage to teeth and also bones.
  • It is extremely corrosive to silicon compounds.
  • It ought to be saved in an airtight plastic bottle.
  • Hydrofluoric acid can not be completely ionized in water due to the fairly solid bonding capability between hydrogen atoms and fluorine atoms.
  • Hydrofluoric acid can liquify lots of glasses (cornerstone: silica) that acids can not.
  • Because of this, it should be kept in plastic (theoretically, a Teflon container would be far better), wax, or lead.
  • Hydrofluoric acid has no lowering homes. If it is to be stored for a long time, not only a sealed container is called for, but the air in the container should be worn down as high as possible.
  • Reacts with silicon and silicon compounds to develop gaseous silicon tetrafluoride (which can rust glass), yet does not wear away plastics, paraffin, gold, lead, as well as platinum.

Related References:

  1. Introduction to Hydrogen Fluoride (Hydrofluoric Acid)” CDC | Excerpted: March 11, 2022.
  2. The pKa of Inorganic and Oxygenated Acids” – Evans, DA | Retrieved March 11, 2022.
  3. Wikipedia

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